Ontos CLEAN - Atmospheric plasma surface treatment

ONTOS CLEAN is a semiautomated system for surface preparation using a patented atmospheric plasma with a unique design enabling, without any modification, oxidizing or reducing chemistry.

It performs cleaning, eliminates organic contamination, activates surfaces and removes oxidation.

An innovative process applies a gaseous passivation that delays the re-oxidation of the metallic surfaces.

Key benefits

• Removes native oxide from metallic and semiconductor surfaces
• Engineered surface termination inhibits re-oxidation
• Removes residual organic contamination films
• Fast, non-toxic, dry, atmospheric process
• Low-energy surface chemistry – CMOS safe
• Ideal surface preparation for direct bonding
• Compact configuration
• Automation compatible

Technical data

Click here to request the Ontos CLEAN datasheet.

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Ontos IS - Atmospheric plasma head for integration into third party equipment

The ONTOS plasma head is available for integration into third party equipment.
3 sizes of plasma head are available – 10 mm, 25 mm and 40 mm.

The Ontos IS system is available on the FC300 Flip-Chip Bonder.

Key benefits

• Downstream radical chemistry only
• CMOS safe, detector safe
• Fast process – continuous throughput capable
• Non-toxic, dry process. OSHA and EPA-friendly

Applications

• Surface preparation for bonding
• Photoresist residue removal
• Photomask cleaning
• Native oxide removal from semiconductor surfaces
• Organic contamination removal prior to adhesive bonding
• Pre-plating surface preparation

Technical data

Click here to request the Ontos IS datasheet.