Advanced R&D and Pilot line oriented
High accuracy and high force
Stepper 0.5 μm for Nano-Imprinting

Optimized for replication of nanostructures, the Stepper NPS300 is the first ever tool able to combine aligned Hot Embossing and UV-NIL on a same platform.

The NPS300 is able to print sub-20 nm geometries with an overlay accuracy of 250 nm.

Its flexible architecture offers an excellent process reproducibility and a unique ability to pattern large areas, in a sequential Step & Repeat mode on wafers up to 300 mm.

It enables the low cost manufacturing of large stamps featuring repeated patterns.


Click here to request the NPS300 Datasheet.


Key Benefits

  Nanoimprinting lithography tool combining Hot Embossing and UV-NIL on wafer up to 300 mm in a Step & Repeat mode

  The sub-20 nm printing resolution and 250 nm overlay accuracy address many applications: patterned media storage, optics, bio, etc…

  Possibility to add inert gas for faster print

  High accuracy and low volume fluid dispense

  Automatic stamp pick-up for higher flexibility and stamp size from 50 / 65 mm extendable up to 100 mm

  Manual or automated wafer loading / unloading

  Air bearing technology and granite structure ensure long-term stability and reliability

Process Capabilities

The Step & Stamp Imprinting Lithography for Hot Embossing or UV NIL is an innovative method that has been demonstrated at the VTT Technical Research Centre of Finland.

  Hot Embossing Lithography: this method consists of transferring the stamp pattern into a thermoplastic embossing material by controlling heat and pressure

  UV-NIL: the Step & Cure method is using in-situ imprinting material dispensing and UV curing. This cutting-edge technology is a very promising solution for replacing standard UV-lithography systems when sub-20 nm resolution is required.


  Photonic devices

  High precision micro-optical arrays and gratings

  High resolution OLED displays

  Large stamp creation

  Other emerging techniques

NIL Technology

Low cost production solutions of nanostructures are in development that may be the driving forces of Semiconductor, MOEMS and optoelectronics technology tomorrow. In particular, Nanoimprint lithography (NIL) and its variations have been developed as a cost-effective alternative to high-resolution e-beam lithography to print sub-20 nm geometries.

Imprinting is based on the principle of mechanically pressing thin polymer film with a stamp containing the nanopattern, in a thermo-mechanical or UV curing process. The patterned polymer can act as a final device, e.g. lense for imaging sensors, micro fluidic chip, biomedical array etc. It can also be used as a high resolution mask for subsequent steps of the process.

Imprinting is a straightforward lithography technology. There are three basic process steps:

 Align the stamp with the substrate which has been pre-coated with the imprinting material
 Press the stamp into the imprinting material to transfer the pattern
written on the stamp surface
 Separate the stamp from the imprinting material

We can describe three imprinting or embossing techniques: Hot Embossing Lithography (HEL) using thermal plastic material, UV-NIL using a liquid resist which is then cured with UV light after molding and Soft Lithography which transfers ink previously applied to a soft stamp onto a substrate using a stamping method.