Hot Embossing Lithography


Nano Imprint Lithography (NIL) permits to replicate patterns which dimensions can be as small as few tens or hundreds of nanometers. Two main processes exist:

  • UV-NIL
  • Hot Embossing Lithography (HEL)

HEL uses controlled temperature and pressure during the imprint process.

Unless the substrate is itself a thermoplastic material, such as polycarbonate for instance, it is coated with the hot embossing material (thermoplastic resist or polymer) using spin coater.