Hot Embossing Lithography
Nano Imprint Lithography (NIL) permits to replicate patterns which dimensions can be as small as few tens or hundreds of nanometers. Two main processes exist:
- Hot Embossing Lithography (HEL)
HEL uses controlled temperature and pressure during the imprint process.
Unless the substrate is itself a thermoplastic material, such as polycarbonate for instance, it is coated with the hot embossing material (thermoplastic resist or polymer) using spin coater.