UV-NIL

 

Nanoimprint Lithography (NIL) allows for replicating patterns whose dimensions can be as small as a few 10s or 100s of nanometers. Two main processes exist:

UV-NIL is a nanoimprint method based on in-situ material dispense, followed by controlled subsequent UV-curing and pressure. Depending on the application requirements, the photoresist can be dispensed before or after the alignment.